Design for Manufacturing in IC Fabrication: Mask Cost, Circuit Performance and Convergence
Ph.D
Saved in:
Main Author: | QU YIFAN |
---|---|
Other Authors: | NUS GRAD SCH FOR INTEGRATIVE SCI & ENGG |
Format: | Theses and Dissertations |
Language: | English |
Published: |
2013
|
Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/48614 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Language: | English |
Similar Items
Similar Items
-
Device performance-based OPC for optimal circuit performance and mask cost reduction
by: Teh, S.-H., et al.
Published: (2014) -
OPC mask simplification using over-designed timing slack of standard cells
by: Qu, Y., et al.
Published: (2014) -
Design-process integration for performance-based OPC framework
by: Teh, S.-H., et al.
Published: (2014) -
Performance-based optical proximity correction methodology
by: Teh, S.-H., et al.
Published: (2014) -
Performance-Based Optical Proximity Correction
by: TEH SIEW HONG
Published: (2011)