Post-cure shrinkage of photo-sensitive material used in laser lithography process

Post-cure shrinkage of photo-sensitive material used in laser lithography process

Journal of Materials Processing Technology

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Bibliographic Details
Main Authors: Fuh, J.Y.H., Chooo, Y.S., Lu, L., Nee, A.Y.C., Wong, Y.S., Wang, W.L., Miyazawa, T., Ho, S.H.
Other Authors: CAE/CAD/CAM CENTRE
Format: Article
Published: 2014
Subjects:
Laser lithography
Photo-polymerisation
Shrinkage
Thermal curing
UV curing
Online Access:http://scholarbank.nus.edu.sg/handle/10635/50381
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Institution: National University of Singapore
id sg-nus-scholar.10635-50381
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spelling sg-nus-scholar.10635-503812015-01-08T19:17:03Z Post-cure shrinkage of photo-sensitive material used in laser lithography process Fuh, J.Y.H. Chooo, Y.S. Lu, L. Nee, A.Y.C. Wong, Y.S. Wang, W.L. Miyazawa, T. Ho, S.H. CAE/CAD/CAM CENTRE MECHANICAL & PRODUCTION ENGINEERING Laser lithography Photo-polymerisation Shrinkage Thermal curing UV curing Journal of Materials Processing Technology 63 1-3 887-891 JMPTE 2014-04-22T06:11:56Z 2014-04-22T06:11:56Z 1997-01 Article Fuh, J.Y.H.,Chooo, Y.S.,Lu, L.,Nee, A.Y.C.,Wong, Y.S.,Wang, W.L.,Miyazawa, T.,Ho, S.H. (1997-01). Post-cure shrinkage of photo-sensitive material used in laser lithography process. Journal of Materials Processing Technology 63 (1-3) : 887-891. ScholarBank@NUS Repository. 09240136 http://scholarbank.nus.edu.sg/handle/10635/50381 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
topic Laser lithography
Photo-polymerisation
Shrinkage
Thermal curing
UV curing
spellingShingle Laser lithography
Photo-polymerisation
Shrinkage
Thermal curing
UV curing
Fuh, J.Y.H.
Chooo, Y.S.
Lu, L.
Nee, A.Y.C.
Wong, Y.S.
Wang, W.L.
Miyazawa, T.
Ho, S.H.
Post-cure shrinkage of photo-sensitive material used in laser lithography process
description Journal of Materials Processing Technology
author2 CAE/CAD/CAM CENTRE
author_facet CAE/CAD/CAM CENTRE
Fuh, J.Y.H.
Chooo, Y.S.
Lu, L.
Nee, A.Y.C.
Wong, Y.S.
Wang, W.L.
Miyazawa, T.
Ho, S.H.
format Article
author Fuh, J.Y.H.
Chooo, Y.S.
Lu, L.
Nee, A.Y.C.
Wong, Y.S.
Wang, W.L.
Miyazawa, T.
Ho, S.H.
author_sort Fuh, J.Y.H.
title Post-cure shrinkage of photo-sensitive material used in laser lithography process
title_short Post-cure shrinkage of photo-sensitive material used in laser lithography process
title_full Post-cure shrinkage of photo-sensitive material used in laser lithography process
title_fullStr Post-cure shrinkage of photo-sensitive material used in laser lithography process
title_full_unstemmed Post-cure shrinkage of photo-sensitive material used in laser lithography process
title_sort post-cure shrinkage of photo-sensitive material used in laser lithography process
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/50381
_version_ 1681083676060811264

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