Post-cure shrinkage of photo-sensitive material used in laser lithography process
Journal of Materials Processing Technology
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Main Authors: | Fuh, J.Y.H., Chooo, Y.S., Lu, L., Nee, A.Y.C., Wong, Y.S., Wang, W.L., Miyazawa, T., Ho, S.H. |
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Other Authors: | CAE/CAD/CAM CENTRE |
Format: | Article |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/50381 |
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Institution: | National University of Singapore |
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