Effect of process related and haze defects on 193 nm immersion lithography

10.1116/1.3271332

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Bibliographic Details
Main Authors: Tay, C.J., Quan, C., Ling, M.L., Lin, Q., Chua, G.S.
Other Authors: MECHANICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/51588
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-515882023-10-25T23:31:37Z Effect of process related and haze defects on 193 nm immersion lithography Tay, C.J. Quan, C. Ling, M.L. Lin, Q. Chua, G.S. MECHANICAL ENGINEERING 10.1116/1.3271332 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 28 1 45-51 JVTBD 2014-04-24T10:16:00Z 2014-04-24T10:16:00Z 2010 Conference Paper Tay, C.J., Quan, C., Ling, M.L., Lin, Q., Chua, G.S. (2010). Effect of process related and haze defects on 193 nm immersion lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 28 (1) : 45-51. ScholarBank@NUS Repository. https://doi.org/10.1116/1.3271332 10711023 http://scholarbank.nus.edu.sg/handle/10635/51588 000275511800039 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1116/1.3271332
author2 MECHANICAL ENGINEERING
author_facet MECHANICAL ENGINEERING
Tay, C.J.
Quan, C.
Ling, M.L.
Lin, Q.
Chua, G.S.
format Conference or Workshop Item
author Tay, C.J.
Quan, C.
Ling, M.L.
Lin, Q.
Chua, G.S.
spellingShingle Tay, C.J.
Quan, C.
Ling, M.L.
Lin, Q.
Chua, G.S.
Effect of process related and haze defects on 193 nm immersion lithography
author_sort Tay, C.J.
title Effect of process related and haze defects on 193 nm immersion lithography
title_short Effect of process related and haze defects on 193 nm immersion lithography
title_full Effect of process related and haze defects on 193 nm immersion lithography
title_fullStr Effect of process related and haze defects on 193 nm immersion lithography
title_full_unstemmed Effect of process related and haze defects on 193 nm immersion lithography
title_sort effect of process related and haze defects on 193 nm immersion lithography
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/51588
_version_ 1781411713215627264