Effect of process related and haze defects on 193 nm immersion lithography
10.1116/1.3271332
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sg-nus-scholar.10635-515882023-10-25T23:31:37Z Effect of process related and haze defects on 193 nm immersion lithography Tay, C.J. Quan, C. Ling, M.L. Lin, Q. Chua, G.S. MECHANICAL ENGINEERING 10.1116/1.3271332 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 28 1 45-51 JVTBD 2014-04-24T10:16:00Z 2014-04-24T10:16:00Z 2010 Conference Paper Tay, C.J., Quan, C., Ling, M.L., Lin, Q., Chua, G.S. (2010). Effect of process related and haze defects on 193 nm immersion lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 28 (1) : 45-51. ScholarBank@NUS Repository. https://doi.org/10.1116/1.3271332 10711023 http://scholarbank.nus.edu.sg/handle/10635/51588 000275511800039 Scopus |
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MECHANICAL ENGINEERING |
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MECHANICAL ENGINEERING Tay, C.J. Quan, C. Ling, M.L. Lin, Q. Chua, G.S. |
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Conference or Workshop Item |
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Tay, C.J. Quan, C. Ling, M.L. Lin, Q. Chua, G.S. |
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Tay, C.J. Quan, C. Ling, M.L. Lin, Q. Chua, G.S. Effect of process related and haze defects on 193 nm immersion lithography |
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Tay, C.J. |
title |
Effect of process related and haze defects on 193 nm immersion lithography |
title_short |
Effect of process related and haze defects on 193 nm immersion lithography |
title_full |
Effect of process related and haze defects on 193 nm immersion lithography |
title_fullStr |
Effect of process related and haze defects on 193 nm immersion lithography |
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Effect of process related and haze defects on 193 nm immersion lithography |
title_sort |
effect of process related and haze defects on 193 nm immersion lithography |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/51588 |
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1781411713215627264 |