Influence of plasma treatment on low-k dielectric films in semiconductor manufacturing

10.1016/j.nimb.2005.06.068

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Bibliographic Details
Main Authors:	Yang, P., Lu, D., Kumar, R., Moser, H.O.
Other Authors:	MECHANICAL ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Subjects:	Atomic force microscopy (AFM) Low-k dielectric thin films Roughness Synchrotron radiation X-ray reflectivity
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/51613
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-51613
record_format	dspace
spelling	sg-nus-scholar.10635-516132023-10-25T23:31:52Z Influence of plasma treatment on low-k dielectric films in semiconductor manufacturing Yang, P. Lu, D. Kumar, R. Moser, H.O. MECHANICAL ENGINEERING SINGAPORE SYNCHROTRON LIGHT SOURCE INSTITUTE OF MICROELECTRONICS Atomic force microscopy (AFM) Low-k dielectric thin films Roughness Synchrotron radiation X-ray reflectivity 10.1016/j.nimb.2005.06.068 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 238 1-4 310-313 NIMBE 2014-04-24T10:16:45Z 2014-04-24T10:16:45Z 2005-08 Conference Paper Yang, P., Lu, D., Kumar, R., Moser, H.O. (2005-08). Influence of plasma treatment on low-k dielectric films in semiconductor manufacturing. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 238 (1-4) : 310-313. ScholarBank@NUS Repository. https://doi.org/10.1016/j.nimb.2005.06.068 0168583X http://scholarbank.nus.edu.sg/handle/10635/51613 000232390400065 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Atomic force microscopy (AFM) Low-k dielectric thin films Roughness Synchrotron radiation X-ray reflectivity
spellingShingle	Atomic force microscopy (AFM) Low-k dielectric thin films Roughness Synchrotron radiation X-ray reflectivity Yang, P. Lu, D. Kumar, R. Moser, H.O. Influence of plasma treatment on low-k dielectric films in semiconductor manufacturing
description	10.1016/j.nimb.2005.06.068
author2	MECHANICAL ENGINEERING
author_facet	MECHANICAL ENGINEERING Yang, P. Lu, D. Kumar, R. Moser, H.O.
format	Conference or Workshop Item
author	Yang, P. Lu, D. Kumar, R. Moser, H.O.
author_sort	Yang, P.
title	Influence of plasma treatment on low-k dielectric films in semiconductor manufacturing
title_short	Influence of plasma treatment on low-k dielectric films in semiconductor manufacturing
title_full	Influence of plasma treatment on low-k dielectric films in semiconductor manufacturing
title_fullStr	Influence of plasma treatment on low-k dielectric films in semiconductor manufacturing
title_full_unstemmed	Influence of plasma treatment on low-k dielectric films in semiconductor manufacturing
title_sort	influence of plasma treatment on low-k dielectric films in semiconductor manufacturing
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/51613
_version_	1781411714172977152

Influence of plasma treatment on low-k dielectric films in semiconductor manufacturing

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