Influence of plasma treatment on low-k dielectric films in semiconductor manufacturing
10.1016/j.nimb.2005.06.068
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Main Authors: | Yang, P., Lu, D., Kumar, R., Moser, H.O. |
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Other Authors: | MECHANICAL ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/51613 |
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Institution: | National University of Singapore |
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