Influence of plasma treatment on low-k dielectric films in semiconductor manufacturing

10.1016/j.nimb.2005.06.068

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Bibliographic Details
Main Authors: Yang, P., Lu, D., Kumar, R., Moser, H.O.
Other Authors: MECHANICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/51613
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Institution: National University of Singapore

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