In-situ X-ray diffraction analysis of the crystallisation of a-SI:H films deposited by the expanding thermal plasma technique

10.1109/PVSC.2011.6186582

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Bibliographic Details
Main Authors: Law, F., Hoex, B., Wang, J., Luther, J., Sharma, K., Creatore, M., Van De Sanden, M.C.M.
Other Authors: SOLAR ENERGY RESEARCH INST OF S'PORE
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/52639
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Institution: National University of Singapore
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Summary:10.1109/PVSC.2011.6186582