In-situ X-ray diffraction analysis of the crystallisation of a-SI:H films deposited by the expanding thermal plasma technique
10.1109/PVSC.2011.6186582
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2014
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sg-nus-scholar.10635-526392015-02-05T02:57:29Z In-situ X-ray diffraction analysis of the crystallisation of a-SI:H films deposited by the expanding thermal plasma technique Law, F. Hoex, B. Wang, J. Luther, J. Sharma, K. Creatore, M. Van De Sanden, M.C.M. SOLAR ENERGY RESEARCH INST OF S'PORE NUS NANOSCIENCE & NANOTECH INITIATIVE MATERIALS SCIENCE AND ENGINEERING 10.1109/PVSC.2011.6186582 Conference Record of the IEEE Photovoltaic Specialists Conference 003026-003030 CRCND 2014-05-16T07:03:08Z 2014-05-16T07:03:08Z 2011 Conference Paper Law, F.,Hoex, B.,Wang, J.,Luther, J.,Sharma, K.,Creatore, M.,Van De Sanden, M.C.M. (2011). In-situ X-ray diffraction analysis of the crystallisation of a-SI:H films deposited by the expanding thermal plasma technique. Conference Record of the IEEE Photovoltaic Specialists Conference : 003026-003030. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/PVSC.2011.6186582" target="_blank">https://doi.org/10.1109/PVSC.2011.6186582</a> 9781424499656 01608371 http://scholarbank.nus.edu.sg/handle/10635/52639 NOT_IN_WOS Scopus |
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10.1109/PVSC.2011.6186582 |
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SOLAR ENERGY RESEARCH INST OF S'PORE |
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SOLAR ENERGY RESEARCH INST OF S'PORE Law, F. Hoex, B. Wang, J. Luther, J. Sharma, K. Creatore, M. Van De Sanden, M.C.M. |
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Conference or Workshop Item |
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Law, F. Hoex, B. Wang, J. Luther, J. Sharma, K. Creatore, M. Van De Sanden, M.C.M. |
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Law, F. Hoex, B. Wang, J. Luther, J. Sharma, K. Creatore, M. Van De Sanden, M.C.M. In-situ X-ray diffraction analysis of the crystallisation of a-SI:H films deposited by the expanding thermal plasma technique |
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Law, F. |
title |
In-situ X-ray diffraction analysis of the crystallisation of a-SI:H films deposited by the expanding thermal plasma technique |
title_short |
In-situ X-ray diffraction analysis of the crystallisation of a-SI:H films deposited by the expanding thermal plasma technique |
title_full |
In-situ X-ray diffraction analysis of the crystallisation of a-SI:H films deposited by the expanding thermal plasma technique |
title_fullStr |
In-situ X-ray diffraction analysis of the crystallisation of a-SI:H films deposited by the expanding thermal plasma technique |
title_full_unstemmed |
In-situ X-ray diffraction analysis of the crystallisation of a-SI:H films deposited by the expanding thermal plasma technique |
title_sort |
in-situ x-ray diffraction analysis of the crystallisation of a-si:h films deposited by the expanding thermal plasma technique |
publishDate |
2014 |
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http://scholarbank.nus.edu.sg/handle/10635/52639 |
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1681084018851840000 |