Diffusion and oxidation of plasma-enhanced chemical-vapor-deposition silicon nitride and underlying metals

10.1116/1.1362679

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Main Authors: Han, G.C., Luo, P., Li, K.B., Wu, Y.H.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/55637
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-556372024-11-11T13:17:18Z Diffusion and oxidation of plasma-enhanced chemical-vapor-deposition silicon nitride and underlying metals Han, G.C. Luo, P. Li, K.B. Wu, Y.H. ELECTRICAL & COMPUTER ENGINEERING PHYSICS 10.1116/1.1362679 Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films 19 3 793-797 JVTAD 2014-06-17T02:45:24Z 2014-06-17T02:45:24Z 2001-05 Article Han, G.C., Luo, P., Li, K.B., Wu, Y.H. (2001-05). Diffusion and oxidation of plasma-enhanced chemical-vapor-deposition silicon nitride and underlying metals. Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films 19 (3) : 793-797. ScholarBank@NUS Repository. https://doi.org/10.1116/1.1362679 07342101 http://scholarbank.nus.edu.sg/handle/10635/55637 000168922300012 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1116/1.1362679
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Han, G.C.
Luo, P.
Li, K.B.
Wu, Y.H.
format Article
author Han, G.C.
Luo, P.
Li, K.B.
Wu, Y.H.
spellingShingle Han, G.C.
Luo, P.
Li, K.B.
Wu, Y.H.
Diffusion and oxidation of plasma-enhanced chemical-vapor-deposition silicon nitride and underlying metals
author_sort Han, G.C.
title Diffusion and oxidation of plasma-enhanced chemical-vapor-deposition silicon nitride and underlying metals
title_short Diffusion and oxidation of plasma-enhanced chemical-vapor-deposition silicon nitride and underlying metals
title_full Diffusion and oxidation of plasma-enhanced chemical-vapor-deposition silicon nitride and underlying metals
title_fullStr Diffusion and oxidation of plasma-enhanced chemical-vapor-deposition silicon nitride and underlying metals
title_full_unstemmed Diffusion and oxidation of plasma-enhanced chemical-vapor-deposition silicon nitride and underlying metals
title_sort diffusion and oxidation of plasma-enhanced chemical-vapor-deposition silicon nitride and underlying metals
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/55637
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