Diffusion and oxidation of plasma-enhanced chemical-vapor-deposition silicon nitride and underlying metals

10.1116/1.1362679

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Bibliographic Details
Main Authors: Han, G.C., Luo, P., Li, K.B., Wu, Y.H.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/55637
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Institution: National University of Singapore

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