Effects of volatility of etch by-products on surface roughness during etching of metal gates in Cl2
10.1149/1.2799079
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2014
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sg-nus-scholar.10635-557852023-10-30T08:13:36Z Effects of volatility of etch by-products on surface roughness during etching of metal gates in Cl2 Hwang, W.S. Cho, B.-J. Chan, D.S.H. Lee, S.W. Yoo, W.J. ELECTRICAL & COMPUTER ENGINEERING 10.1149/1.2799079 Journal of the Electrochemical Society 155 1 H6-H10 JESOA 2014-06-17T02:47:05Z 2014-06-17T02:47:05Z 2008 Article Hwang, W.S., Cho, B.-J., Chan, D.S.H., Lee, S.W., Yoo, W.J. (2008). Effects of volatility of etch by-products on surface roughness during etching of metal gates in Cl2. Journal of the Electrochemical Society 155 (1) : H6-H10. ScholarBank@NUS Repository. https://doi.org/10.1149/1.2799079 00134651 http://scholarbank.nus.edu.sg/handle/10635/55785 000251241400059 Scopus |
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National University of Singapore |
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NUS Library |
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Asia |
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Singapore Singapore |
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ScholarBank@NUS |
| description |
10.1149/1.2799079 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Hwang, W.S. Cho, B.-J. Chan, D.S.H. Lee, S.W. Yoo, W.J. |
| format |
Article |
| author |
Hwang, W.S. Cho, B.-J. Chan, D.S.H. Lee, S.W. Yoo, W.J. |
| spellingShingle |
Hwang, W.S. Cho, B.-J. Chan, D.S.H. Lee, S.W. Yoo, W.J. Effects of volatility of etch by-products on surface roughness during etching of metal gates in Cl2 |
| author_sort |
Hwang, W.S. |
| title |
Effects of volatility of etch by-products on surface roughness during etching of metal gates in Cl2 |
| title_short |
Effects of volatility of etch by-products on surface roughness during etching of metal gates in Cl2 |
| title_full |
Effects of volatility of etch by-products on surface roughness during etching of metal gates in Cl2 |
| title_fullStr |
Effects of volatility of etch by-products on surface roughness during etching of metal gates in Cl2 |
| title_full_unstemmed |
Effects of volatility of etch by-products on surface roughness during etching of metal gates in Cl2 |
| title_sort |
effects of volatility of etch by-products on surface roughness during etching of metal gates in cl2 |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/55785 |
| _version_ |
1781412189862625280 |