Effects of volatility of etch by-products on surface roughness during etching of metal gates in Cl2
10.1149/1.2799079
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Main Authors: | Hwang, W.S., Cho, B.-J., Chan, D.S.H., Lee, S.W., Yoo, W.J. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/55785 |
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Institution: | National University of Singapore |
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