Exposure of defects in GaN by plasma etching
10.1007/s00339-003-2372-5
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sg-nus-scholar.10635-559702023-11-01T07:05:01Z Exposure of defects in GaN by plasma etching Choi, H.W. Liu, C. Cheong, M.G. Zhang, J. Chua, S.J. ELECTRICAL & COMPUTER ENGINEERING 10.1007/s00339-003-2372-5 Applied Physics A: Materials Science and Processing 80 2 405-407 APAMF 2014-06-17T02:49:13Z 2014-06-17T02:49:13Z 2005-02 Article Choi, H.W., Liu, C., Cheong, M.G., Zhang, J., Chua, S.J. (2005-02). Exposure of defects in GaN by plasma etching. Applied Physics A: Materials Science and Processing 80 (2) : 405-407. ScholarBank@NUS Repository. https://doi.org/10.1007/s00339-003-2372-5 09478396 http://scholarbank.nus.edu.sg/handle/10635/55970 000225864600036 Scopus |
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10.1007/s00339-003-2372-5 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Choi, H.W. Liu, C. Cheong, M.G. Zhang, J. Chua, S.J. |
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Choi, H.W. Liu, C. Cheong, M.G. Zhang, J. Chua, S.J. |
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Choi, H.W. Liu, C. Cheong, M.G. Zhang, J. Chua, S.J. Exposure of defects in GaN by plasma etching |
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Choi, H.W. |
title |
Exposure of defects in GaN by plasma etching |
title_short |
Exposure of defects in GaN by plasma etching |
title_full |
Exposure of defects in GaN by plasma etching |
title_fullStr |
Exposure of defects in GaN by plasma etching |
title_full_unstemmed |
Exposure of defects in GaN by plasma etching |
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exposure of defects in gan by plasma etching |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/55970 |
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