Exposure of defects in GaN by plasma etching

10.1007/s00339-003-2372-5

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Main Authors: Choi, H.W., Liu, C., Cheong, M.G., Zhang, J., Chua, S.J.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/55970
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-559702023-11-01T07:05:01Z Exposure of defects in GaN by plasma etching Choi, H.W. Liu, C. Cheong, M.G. Zhang, J. Chua, S.J. ELECTRICAL & COMPUTER ENGINEERING 10.1007/s00339-003-2372-5 Applied Physics A: Materials Science and Processing 80 2 405-407 APAMF 2014-06-17T02:49:13Z 2014-06-17T02:49:13Z 2005-02 Article Choi, H.W., Liu, C., Cheong, M.G., Zhang, J., Chua, S.J. (2005-02). Exposure of defects in GaN by plasma etching. Applied Physics A: Materials Science and Processing 80 (2) : 405-407. ScholarBank@NUS Repository. https://doi.org/10.1007/s00339-003-2372-5 09478396 http://scholarbank.nus.edu.sg/handle/10635/55970 000225864600036 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1007/s00339-003-2372-5
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Choi, H.W.
Liu, C.
Cheong, M.G.
Zhang, J.
Chua, S.J.
format Article
author Choi, H.W.
Liu, C.
Cheong, M.G.
Zhang, J.
Chua, S.J.
spellingShingle Choi, H.W.
Liu, C.
Cheong, M.G.
Zhang, J.
Chua, S.J.
Exposure of defects in GaN by plasma etching
author_sort Choi, H.W.
title Exposure of defects in GaN by plasma etching
title_short Exposure of defects in GaN by plasma etching
title_full Exposure of defects in GaN by plasma etching
title_fullStr Exposure of defects in GaN by plasma etching
title_full_unstemmed Exposure of defects in GaN by plasma etching
title_sort exposure of defects in gan by plasma etching
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/55970
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