Exposure of defects in GaN by plasma etching

Exposure of defects in GaN by plasma etching

10.1007/s00339-003-2372-5

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Bibliographic Details
Main Authors:	Choi, H.W., Liu, C., Cheong, M.G., Zhang, J., Chua, S.J.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/55970
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Institution:	National University of Singapore

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