Fabrication of gate stack with high gate work function for implantless enhancement-mode GaAs n -channel metal-oxide-semiconductor field effect transistor applications
10.1063/1.2905259
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sg-nus-scholar.10635-559862023-11-01T07:05:05Z Fabrication of gate stack with high gate work function for implantless enhancement-mode GaAs n -channel metal-oxide-semiconductor field effect transistor applications Zhu, M. Chin, H.-C. Samudra, G.S. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.2905259 Applied Physics Letters 92 12 - APPLA 2014-06-17T02:49:24Z 2014-06-17T02:49:24Z 2008 Article Zhu, M., Chin, H.-C., Samudra, G.S., Yeo, Y.-C. (2008). Fabrication of gate stack with high gate work function for implantless enhancement-mode GaAs n -channel metal-oxide-semiconductor field effect transistor applications. Applied Physics Letters 92 (12) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2905259 00036951 http://scholarbank.nus.edu.sg/handle/10635/55986 000254510300100 Scopus |
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Asia |
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Singapore Singapore |
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| description |
10.1063/1.2905259 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Zhu, M. Chin, H.-C. Samudra, G.S. Yeo, Y.-C. |
| format |
Article |
| author |
Zhu, M. Chin, H.-C. Samudra, G.S. Yeo, Y.-C. |
| spellingShingle |
Zhu, M. Chin, H.-C. Samudra, G.S. Yeo, Y.-C. Fabrication of gate stack with high gate work function for implantless enhancement-mode GaAs n -channel metal-oxide-semiconductor field effect transistor applications |
| author_sort |
Zhu, M. |
| title |
Fabrication of gate stack with high gate work function for implantless enhancement-mode GaAs n -channel metal-oxide-semiconductor field effect transistor applications |
| title_short |
Fabrication of gate stack with high gate work function for implantless enhancement-mode GaAs n -channel metal-oxide-semiconductor field effect transistor applications |
| title_full |
Fabrication of gate stack with high gate work function for implantless enhancement-mode GaAs n -channel metal-oxide-semiconductor field effect transistor applications |
| title_fullStr |
Fabrication of gate stack with high gate work function for implantless enhancement-mode GaAs n -channel metal-oxide-semiconductor field effect transistor applications |
| title_full_unstemmed |
Fabrication of gate stack with high gate work function for implantless enhancement-mode GaAs n -channel metal-oxide-semiconductor field effect transistor applications |
| title_sort |
fabrication of gate stack with high gate work function for implantless enhancement-mode gaas n -channel metal-oxide-semiconductor field effect transistor applications |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/55986 |
| _version_ |
1781781091420471296 |