In situ measurement of wafer temperature using two sensors with different dynamical properties
10.1088/0957-0233/17/11/014
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sg-nus-scholar.10635-562972023-10-25T23:12:52Z In situ measurement of wafer temperature using two sensors with different dynamical properties Tan, W.W. Tang, J.C. Loh, A.P. Tay, A. ELECTRICAL & COMPUTER ENGINEERING In situ temperature measurement Post-exposure bake Prediction 10.1088/0957-0233/17/11/014 Measurement Science and Technology 17 11 2957-2963 MSTCE 2014-06-17T02:52:59Z 2014-06-17T02:52:59Z 2006-11-01 Article Tan, W.W., Tang, J.C., Loh, A.P., Tay, A. (2006-11-01). In situ measurement of wafer temperature using two sensors with different dynamical properties. Measurement Science and Technology 17 (11) : 2957-2963. ScholarBank@NUS Repository. https://doi.org/10.1088/0957-0233/17/11/014 09570233 http://scholarbank.nus.edu.sg/handle/10635/56297 000241991300015 Scopus |
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In situ temperature measurement Post-exposure bake Prediction |
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In situ temperature measurement Post-exposure bake Prediction Tan, W.W. Tang, J.C. Loh, A.P. Tay, A. In situ measurement of wafer temperature using two sensors with different dynamical properties |
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10.1088/0957-0233/17/11/014 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Tan, W.W. Tang, J.C. Loh, A.P. Tay, A. |
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Tan, W.W. Tang, J.C. Loh, A.P. Tay, A. |
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Tan, W.W. |
title |
In situ measurement of wafer temperature using two sensors with different dynamical properties |
title_short |
In situ measurement of wafer temperature using two sensors with different dynamical properties |
title_full |
In situ measurement of wafer temperature using two sensors with different dynamical properties |
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In situ measurement of wafer temperature using two sensors with different dynamical properties |
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In situ measurement of wafer temperature using two sensors with different dynamical properties |
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in situ measurement of wafer temperature using two sensors with different dynamical properties |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/56297 |
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