Large area resist-free soft lithographic patterning of graphene

10.1002/smll.201201889

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Bibliographic Details
Main Authors:	George, A., Mathew, S., Van Gastel, R., Nijland, M., Gopinadhan, K., Brinks, P., Venkatesan, T., Ten Elshof, J.E.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	graphene patterning plasma etching resist-free patterning soft lithography
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/56450
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-56450
record_format	dspace
spelling	sg-nus-scholar.10635-564502024-11-14T06:06:40Z Large area resist-free soft lithographic patterning of graphene George, A. Mathew, S. Van Gastel, R. Nijland, M. Gopinadhan, K. Brinks, P. Venkatesan, T. Ten Elshof, J.E. ELECTRICAL & COMPUTER ENGINEERING graphene patterning plasma etching resist-free patterning soft lithography 10.1002/smll.201201889 Small 9 5 711-715 SMALB 2014-06-17T02:54:43Z 2014-06-17T02:54:43Z 2013-03-11 Article George, A., Mathew, S., Van Gastel, R., Nijland, M., Gopinadhan, K., Brinks, P., Venkatesan, T., Ten Elshof, J.E. (2013-03-11). Large area resist-free soft lithographic patterning of graphene. Small 9 (5) : 711-715. ScholarBank@NUS Repository. https://doi.org/10.1002/smll.201201889 16136810 http://scholarbank.nus.edu.sg/handle/10635/56450 000315769700010 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	graphene patterning plasma etching resist-free patterning soft lithography
spellingShingle	graphene patterning plasma etching resist-free patterning soft lithography George, A. Mathew, S. Van Gastel, R. Nijland, M. Gopinadhan, K. Brinks, P. Venkatesan, T. Ten Elshof, J.E. Large area resist-free soft lithographic patterning of graphene
description	10.1002/smll.201201889
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING George, A. Mathew, S. Van Gastel, R. Nijland, M. Gopinadhan, K. Brinks, P. Venkatesan, T. Ten Elshof, J.E.
format	Article
author	George, A. Mathew, S. Van Gastel, R. Nijland, M. Gopinadhan, K. Brinks, P. Venkatesan, T. Ten Elshof, J.E.
author_sort	George, A.
title	Large area resist-free soft lithographic patterning of graphene
title_short	Large area resist-free soft lithographic patterning of graphene
title_full	Large area resist-free soft lithographic patterning of graphene
title_fullStr	Large area resist-free soft lithographic patterning of graphene
title_full_unstemmed	Large area resist-free soft lithographic patterning of graphene
title_sort	large area resist-free soft lithographic patterning of graphene
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/56450
_version_	1821183489099169792

Large area resist-free soft lithographic patterning of graphene

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