Large area resist-free soft lithographic patterning of graphene

10.1002/smll.201201889

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Bibliographic Details
Main Authors:	George, A., Mathew, S., Van Gastel, R., Nijland, M., Gopinadhan, K., Brinks, P., Venkatesan, T., Ten Elshof, J.E.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	graphene patterning plasma etching resist-free patterning soft lithography
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/56450
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Institution:	National University of Singapore

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