Large area resist-free soft lithographic patterning of graphene
10.1002/smll.201201889
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Main Authors: | George, A., Mathew, S., Van Gastel, R., Nijland, M., Gopinadhan, K., Brinks, P., Venkatesan, T., Ten Elshof, J.E. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/56450 |
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Institution: | National University of Singapore |
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