Low Schottky barrier height for silicides on n -type Si (100) by interfacial selenium segregation during silicidation

Low Schottky barrier height for silicides on n -type Si (100) by interfacial selenium segregation during silicidation

10.1063/1.2970958

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Main Authors: Wong, H.-S., Chan, L., Samudra, G., Yeo, Y.-C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/56529
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-565292023-10-25T22:49:49Z Low Schottky barrier height for silicides on n -type Si (100) by interfacial selenium segregation during silicidation Wong, H.-S. Chan, L. Samudra, G. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.2970958 Applied Physics Letters 93 7 - APPLA 2014-06-17T02:55:39Z 2014-06-17T02:55:39Z 2008 Article Wong, H.-S., Chan, L., Samudra, G., Yeo, Y.-C. (2008). Low Schottky barrier height for silicides on n -type Si (100) by interfacial selenium segregation during silicidation. Applied Physics Letters 93 (7) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2970958 00036951 http://scholarbank.nus.edu.sg/handle/10635/56529 000259010300032 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1063/1.2970958
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Wong, H.-S.
Chan, L.
Samudra, G.
Yeo, Y.-C.
format Article
author Wong, H.-S.
Chan, L.
Samudra, G.
Yeo, Y.-C.
spellingShingle Wong, H.-S.
Chan, L.
Samudra, G.
Yeo, Y.-C.
Low Schottky barrier height for silicides on n -type Si (100) by interfacial selenium segregation during silicidation
author_sort Wong, H.-S.
title Low Schottky barrier height for silicides on n -type Si (100) by interfacial selenium segregation during silicidation
title_short Low Schottky barrier height for silicides on n -type Si (100) by interfacial selenium segregation during silicidation
title_full Low Schottky barrier height for silicides on n -type Si (100) by interfacial selenium segregation during silicidation
title_fullStr Low Schottky barrier height for silicides on n -type Si (100) by interfacial selenium segregation during silicidation
title_full_unstemmed Low Schottky barrier height for silicides on n -type Si (100) by interfacial selenium segregation during silicidation
title_sort low schottky barrier height for silicides on n -type si (100) by interfacial selenium segregation during silicidation
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/56529
_version_ 1781781197132660736

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