Low Schottky barrier height for silicides on n -type Si (100) by interfacial selenium segregation during silicidation
10.1063/1.2970958
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Main Authors: | Wong, H.-S., Chan, L., Samudra, G., Yeo, Y.-C. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/56529 |
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Institution: | National University of Singapore |
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