Schottky barrier height modulation with aluminum segregation and pulsed laser anneal: A route for contact resistance reduction

• Main Authors: Koh, S.-M., Ng, C.-M., Liu, P., Mo, Z.-Q., Wang, X., Zheng, H., Zhao, Z.-Y., Variam, N., Henry, T., Erokhin, Y., Samudra, G.S., Yeo, Y.-C.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/84156
• Institution: National University of Singapore

10.1109/IWJT.2010.5474983