Schottky barrier height modulation with aluminum segregation and pulsed laser anneal: A route for contact resistance reduction

Schottky barrier height modulation with aluminum segregation and pulsed laser anneal: A route for contact resistance reduction

10.1109/IWJT.2010.5474983

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Bibliographic Details
Main Authors: Koh, S.-M., Ng, C.-M., Liu, P., Mo, Z.-Q., Wang, X., Zheng, H., Zhao, Z.-Y., Variam, N., Henry, T., Erokhin, Y., Samudra, G.S., Yeo, Y.-C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/84156
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Institution: National University of Singapore
Description
Summary:10.1109/IWJT.2010.5474983

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