Phase shift mask fabrication by laser microlens array lithography for periodic nanostructures patterning

Phase shift mask fabrication by laser microlens array lithography for periodic nanostructures patterning

10.2961/jlmn.2010.03.0010

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Bibliographic Details
Main Authors: Huang, Z., Lin, Q.Y., Hong, M.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Lithography
Microlens array
Multi-beam
Parallel processing
Periodic structures
Phase shift mask
Online Access:http://scholarbank.nus.edu.sg/handle/10635/57048
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Institution: National University of Singapore
Description
Summary:10.2961/jlmn.2010.03.0010

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