Strained p-channel FinFETs with extended Π-shaped silicon-germanium source and drain stressors
10.1109/LED.2007.905406
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| التنسيق: | مقال |
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2014
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| الوصول للمادة أونلاين: | http://scholarbank.nus.edu.sg/handle/10635/57525 |
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sg-nus-scholar.10635-575252024-11-11T07:46:32Z Strained p-channel FinFETs with extended Π-shaped silicon-germanium source and drain stressors Tan, K.-M. Liow, T.-Y. Lee, R.T.P. Hoe, K.M. Tung, C.-H. Balasubramanian, N. Samudra, G.S. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING Extended-II FinFET Multiple gate SiGe Source/drain stressors Strain Stress 10.1109/LED.2007.905406 IEEE Electron Device Letters 28 10 905-908 EDLED 2014-06-17T03:07:10Z 2014-06-17T03:07:10Z 2007-10 Article Tan, K.-M., Liow, T.-Y., Lee, R.T.P., Hoe, K.M., Tung, C.-H., Balasubramanian, N., Samudra, G.S., Yeo, Y.-C. (2007-10). Strained p-channel FinFETs with extended Π-shaped silicon-germanium source and drain stressors. IEEE Electron Device Letters 28 (10) : 905-908. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2007.905406 07413106 http://scholarbank.nus.edu.sg/handle/10635/57525 000249942100019 Scopus |
| institution |
National University of Singapore |
| building |
NUS Library |
| continent |
Asia |
| country |
Singapore Singapore |
| content_provider |
NUS Library |
| collection |
ScholarBank@NUS |
| topic |
Extended-II FinFET Multiple gate SiGe Source/drain stressors Strain Stress |
| spellingShingle |
Extended-II FinFET Multiple gate SiGe Source/drain stressors Strain Stress Tan, K.-M. Liow, T.-Y. Lee, R.T.P. Hoe, K.M. Tung, C.-H. Balasubramanian, N. Samudra, G.S. Yeo, Y.-C. Strained p-channel FinFETs with extended Π-shaped silicon-germanium source and drain stressors |
| description |
10.1109/LED.2007.905406 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Tan, K.-M. Liow, T.-Y. Lee, R.T.P. Hoe, K.M. Tung, C.-H. Balasubramanian, N. Samudra, G.S. Yeo, Y.-C. |
| format |
Article |
| author |
Tan, K.-M. Liow, T.-Y. Lee, R.T.P. Hoe, K.M. Tung, C.-H. Balasubramanian, N. Samudra, G.S. Yeo, Y.-C. |
| author_sort |
Tan, K.-M. |
| title |
Strained p-channel FinFETs with extended Π-shaped silicon-germanium source and drain stressors |
| title_short |
Strained p-channel FinFETs with extended Π-shaped silicon-germanium source and drain stressors |
| title_full |
Strained p-channel FinFETs with extended Π-shaped silicon-germanium source and drain stressors |
| title_fullStr |
Strained p-channel FinFETs with extended Π-shaped silicon-germanium source and drain stressors |
| title_full_unstemmed |
Strained p-channel FinFETs with extended Π-shaped silicon-germanium source and drain stressors |
| title_sort |
strained p-channel finfets with extended π-shaped silicon-germanium source and drain stressors |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/57525 |
| _version_ |
1821197801685516288 |