Sub-30 nm lithography with near-field scanning optical microscope combined with femtosecond laser

Sub-30 nm lithography with near-field scanning optical microscope combined with femtosecond laser

10.1007/s00339-004-3093-0

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Bibliographic Details
Main Authors: Lin, Y., Hong, M.H., Wang, W.J., Law, Y.Z., Chong, T.C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/57548
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/57548

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