Determining interfacial properties of submicron low- k films on Si substrate by using wedge indentation technique

10.1063/1.2749473

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Main Authors:	Yeap, K.B., Zeng, K., Jiang, H., Shen, L., Chi, D.
Other Authors:	MECHANICAL ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/59889
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Institution:	National University of Singapore

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spelling	sg-nus-scholar.10635-598892023-10-25T22:59:18Z Determining interfacial properties of submicron low- k films on Si substrate by using wedge indentation technique Yeap, K.B. Zeng, K. Jiang, H. Shen, L. Chi, D. MECHANICAL ENGINEERING 10.1063/1.2749473 Journal of Applied Physics 101 12 - JAPIA 2014-06-17T06:16:46Z 2014-06-17T06:16:46Z 2007 Article Yeap, K.B., Zeng, K., Jiang, H., Shen, L., Chi, D. (2007). Determining interfacial properties of submicron low- k films on Si substrate by using wedge indentation technique. Journal of Applied Physics 101 (12) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2749473 00218979 http://scholarbank.nus.edu.sg/handle/10635/59889 000247625700057 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1063/1.2749473
author2	MECHANICAL ENGINEERING
author_facet	MECHANICAL ENGINEERING Yeap, K.B. Zeng, K. Jiang, H. Shen, L. Chi, D.
format	Article
author	Yeap, K.B. Zeng, K. Jiang, H. Shen, L. Chi, D.
spellingShingle	Yeap, K.B. Zeng, K. Jiang, H. Shen, L. Chi, D. Determining interfacial properties of submicron low- k films on Si substrate by using wedge indentation technique
author_sort	Yeap, K.B.
title	Determining interfacial properties of submicron low- k films on Si substrate by using wedge indentation technique
title_short	Determining interfacial properties of submicron low- k films on Si substrate by using wedge indentation technique
title_full	Determining interfacial properties of submicron low- k films on Si substrate by using wedge indentation technique
title_fullStr	Determining interfacial properties of submicron low- k films on Si substrate by using wedge indentation technique
title_full_unstemmed	Determining interfacial properties of submicron low- k films on Si substrate by using wedge indentation technique
title_sort	determining interfacial properties of submicron low- k films on si substrate by using wedge indentation technique
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/59889
_version_	1781781723092090880

Determining interfacial properties of submicron low- k films on Si substrate by using wedge indentation technique

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