Annealing of Fowler-Nordheim stress-induced leakage currents in thin silicon dioxide films

10.1149/1.1394122

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Bibliographic Details
Main Authors:	Ang, C.H., Ling, C.H., Cheng, Z.Y., Kim, S.J., Cho, B.J.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/61846
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-61846
record_format	dspace
spelling	sg-nus-scholar.10635-618462023-10-30T20:11:35Z Annealing of Fowler-Nordheim stress-induced leakage currents in thin silicon dioxide films Ang, C.H. Ling, C.H. Cheng, Z.Y. Kim, S.J. Cho, B.J. ELECTRICAL ENGINEERING 10.1149/1.1394122 Journal of the Electrochemical Society 147 12 4676-4682 JESOA 2014-06-17T06:44:39Z 2014-06-17T06:44:39Z 2000-12 Article Ang, C.H., Ling, C.H., Cheng, Z.Y., Kim, S.J., Cho, B.J. (2000-12). Annealing of Fowler-Nordheim stress-induced leakage currents in thin silicon dioxide films. Journal of the Electrochemical Society 147 (12) : 4676-4682. ScholarBank@NUS Repository. https://doi.org/10.1149/1.1394122 00134651 http://scholarbank.nus.edu.sg/handle/10635/61846 000165469800048 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1149/1.1394122
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Ang, C.H. Ling, C.H. Cheng, Z.Y. Kim, S.J. Cho, B.J.
format	Article
author	Ang, C.H. Ling, C.H. Cheng, Z.Y. Kim, S.J. Cho, B.J.
spellingShingle	Ang, C.H. Ling, C.H. Cheng, Z.Y. Kim, S.J. Cho, B.J. Annealing of Fowler-Nordheim stress-induced leakage currents in thin silicon dioxide films
author_sort	Ang, C.H.
title	Annealing of Fowler-Nordheim stress-induced leakage currents in thin silicon dioxide films
title_short	Annealing of Fowler-Nordheim stress-induced leakage currents in thin silicon dioxide films
title_full	Annealing of Fowler-Nordheim stress-induced leakage currents in thin silicon dioxide films
title_fullStr	Annealing of Fowler-Nordheim stress-induced leakage currents in thin silicon dioxide films
title_full_unstemmed	Annealing of Fowler-Nordheim stress-induced leakage currents in thin silicon dioxide films
title_sort	annealing of fowler-nordheim stress-induced leakage currents in thin silicon dioxide films
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/61846
_version_	1781782117751980032

Annealing of Fowler-Nordheim stress-induced leakage currents in thin silicon dioxide films

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