Ion-assisted pulsed laser deposition of aluminum nitride thin films
Journal of Applied Physics
Saved in:
Main Authors: | Lu, Y.F., Ren, Z.M., Chong, T.C., Cheong, B.A., Chow, S.K., Wang, J.P. |
---|---|
Other Authors: | ELECTRICAL ENGINEERING |
Format: | Article |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/62358 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
Ion source assisted pulse laser deposition of carbon nitride thin films
by: He, Z.F., et al.
Published: (2014) -
Ion-source-assisted pulsed laser deposition of carbon nitride thin films
by: He, Z.F., et al.
Published: (2014) -
Influence of ion-beam energy and substrate temperature on the synthesis of carbon nitride thin films by nitrogen-ion-assisted pulsed laser deposition
by: Lu, Y.F., et al.
Published: (2014) -
Influence of laser fluence and laser repetition rate on the syntheses of aluminium nitride thin films by nitrogen-ion-assisted pulsed laser deposition
by: Whatt, G.Y., et al.
Published: (2014) -
Influence of substrate temperature and ion-beam energy on the syntheses of aluminium nitride thin films by nitrogen-ion-assisted pulsed-laser deposition
by: Goh, Y.W., et al.
Published: (2014)