Low-frequency noise characterizattion of latent damage in thin oxides subjected to high-field impulse stressing

IEEE Electron Device Letters

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Main Authors:	Chim, W.K., Yeo, B.P., Lim, P.S., Chan, D.S.H.
Other Authors:	ELECTRICAL ENGINEERING
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/62394
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-62394
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spelling	sg-nus-scholar.10635-623942021-10-05T10:02:24Z Low-frequency noise characterizattion of latent damage in thin oxides subjected to high-field impulse stressing Chim, W.K. Yeo, B.P. Lim, P.S. Chan, D.S.H. ELECTRICAL ENGINEERING IEEE Electron Device Letters 19 10 363-366 EDLED 2014-06-17T06:50:34Z 2014-06-17T06:50:34Z 1998-10 Chim, W.K., Yeo, B.P., Lim, P.S., Chan, D.S.H. (1998-10). Low-frequency noise characterizattion of latent damage in thin oxides subjected to high-field impulse stressing. IEEE Electron Device Letters 19 (10) : 363-366. ScholarBank@NUS Repository. 07413106 http://scholarbank.nus.edu.sg/handle/10635/62394 000076221200001 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	IEEE Electron Device Letters
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Chim, W.K. Yeo, B.P. Lim, P.S. Chan, D.S.H.
author	Chim, W.K. Yeo, B.P. Lim, P.S. Chan, D.S.H.
spellingShingle	Chim, W.K. Yeo, B.P. Lim, P.S. Chan, D.S.H. Low-frequency noise characterizattion of latent damage in thin oxides subjected to high-field impulse stressing
author_sort	Chim, W.K.
title	Low-frequency noise characterizattion of latent damage in thin oxides subjected to high-field impulse stressing
title_short	Low-frequency noise characterizattion of latent damage in thin oxides subjected to high-field impulse stressing
title_full	Low-frequency noise characterizattion of latent damage in thin oxides subjected to high-field impulse stressing
title_fullStr	Low-frequency noise characterizattion of latent damage in thin oxides subjected to high-field impulse stressing
title_full_unstemmed	Low-frequency noise characterizattion of latent damage in thin oxides subjected to high-field impulse stressing
title_sort	low-frequency noise characterizattion of latent damage in thin oxides subjected to high-field impulse stressing
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/62394
_version_	1713205672186740736

Low-frequency noise characterizattion of latent damage in thin oxides subjected to high-field impulse stressing

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