Defect engineering by surface chemical state in boron-doped preamorphized silicon

Defect engineering by surface chemical state in boron-doped preamorphized silicon

10.1063/1.2780080

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Bibliographic Details
Main Authors: Yeong, S.H., Srinivasan, M.P., Colombeau, B., Chan, L., Akkipeddi, R., Kwok, C.T.M., Vaidyanathan, R., Seebauer, E.G.
Other Authors: CHEMICAL & BIOMOLECULAR ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/63693
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/63693

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