Nanoporous ultra-low-dielectric-constant fluoropolymer films via selective UV decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization

Nanoporous ultra-low-dielectric-constant fluoropolymer films via selective UV decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization

10.1002/adfm.200400138

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Bibliographic Details
Main Authors: Fu, G.-D., Yuan, Z., Kang, E.-T., Neoh, K.-G., Lai, D.M., Huan, A.C.H.
Other Authors: CHEMICAL & BIOMOLECULAR ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/64283
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Institution: National University of Singapore
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Summary:10.1002/adfm.200400138

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