Nanoporous ultra-low-dielectric-constant fluoropolymer films via selective UV decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization
10.1002/adfm.200400138
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Main Authors: | Fu, G.-D., Yuan, Z., Kang, E.-T., Neoh, K.-G., Lai, D.M., Huan, A.C.H. |
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Other Authors: | CHEMICAL & BIOMOLECULAR ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/64283 |
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Institution: | National University of Singapore |
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