Nanoporous ultra-low-dielectric-constant fluoropolymer films via selective UV decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization
10.1002/adfm.200400138
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2014
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sg-nus-scholar.10635-642832023-10-26T21:19:51Z Nanoporous ultra-low-dielectric-constant fluoropolymer films via selective UV decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization Fu, G.-D. Yuan, Z. Kang, E.-T. Neoh, K.-G. Lai, D.M. Huan, A.C.H. CHEMICAL & BIOMOLECULAR ENGINEERING 10.1002/adfm.200400138 Advanced Functional Materials 15 2 315-322 AFMDC 2014-06-17T07:45:23Z 2014-06-17T07:45:23Z 2005-02 Article Fu, G.-D., Yuan, Z., Kang, E.-T., Neoh, K.-G., Lai, D.M., Huan, A.C.H. (2005-02). Nanoporous ultra-low-dielectric-constant fluoropolymer films via selective UV decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization. Advanced Functional Materials 15 (2) : 315-322. ScholarBank@NUS Repository. https://doi.org/10.1002/adfm.200400138 1616301X http://scholarbank.nus.edu.sg/handle/10635/64283 000227403100019 Scopus |
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National University of Singapore |
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NUS Library |
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Asia |
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Singapore Singapore |
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| description |
10.1002/adfm.200400138 |
| author2 |
CHEMICAL & BIOMOLECULAR ENGINEERING |
| author_facet |
CHEMICAL & BIOMOLECULAR ENGINEERING Fu, G.-D. Yuan, Z. Kang, E.-T. Neoh, K.-G. Lai, D.M. Huan, A.C.H. |
| format |
Article |
| author |
Fu, G.-D. Yuan, Z. Kang, E.-T. Neoh, K.-G. Lai, D.M. Huan, A.C.H. |
| spellingShingle |
Fu, G.-D. Yuan, Z. Kang, E.-T. Neoh, K.-G. Lai, D.M. Huan, A.C.H. Nanoporous ultra-low-dielectric-constant fluoropolymer films via selective UV decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization |
| author_sort |
Fu, G.-D. |
| title |
Nanoporous ultra-low-dielectric-constant fluoropolymer films via selective UV decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization |
| title_short |
Nanoporous ultra-low-dielectric-constant fluoropolymer films via selective UV decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization |
| title_full |
Nanoporous ultra-low-dielectric-constant fluoropolymer films via selective UV decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization |
| title_fullStr |
Nanoporous ultra-low-dielectric-constant fluoropolymer films via selective UV decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization |
| title_full_unstemmed |
Nanoporous ultra-low-dielectric-constant fluoropolymer films via selective UV decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization |
| title_sort |
nanoporous ultra-low-dielectric-constant fluoropolymer films via selective uv decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/64283 |
| _version_ |
1781782391200677888 |