Nanoporous ultra-low-dielectric-constant fluoropolymer films via selective UV decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization

• Main Authors: Fu, G.-D., Yuan, Z., Kang, E.-T., Neoh, K.-G., Lai, D.M., Huan, A.C.H.
• Other Authors: CHEMICAL & BIOMOLECULAR ENGINEERING
• Format: Article
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/64283
• Institution: National University of Singapore

10.1002/adfm.200400138