Via resistance reduction using "cool" PVD-Ta processing
10.1149/1.1621417
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sg-nus-scholar.10635-668992023-10-30T08:14:52Z Via resistance reduction using "cool" PVD-Ta processing Seet, C.S. Zhang, B.C. Yong, C. Liew, S.L. Li, K. Hsia, L.C. Seng, H.L. Osiposwicz, T. Sudijono, J. Zeng, H.C. Tan, J.B. PHYSICS CHEMICAL & ENVIRONMENTAL ENGINEERING 10.1149/1.1621417 Journal of the Electrochemical Society 150 12 G766-G770 JESOA 2014-06-17T08:35:45Z 2014-06-17T08:35:45Z 2003-12 Article Seet, C.S., Zhang, B.C., Yong, C., Liew, S.L., Li, K., Hsia, L.C., Seng, H.L., Osiposwicz, T., Sudijono, J., Zeng, H.C., Tan, J.B. (2003-12). Via resistance reduction using "cool" PVD-Ta processing. Journal of the Electrochemical Society 150 (12) : G766-G770. ScholarBank@NUS Repository. https://doi.org/10.1149/1.1621417 00134651 http://scholarbank.nus.edu.sg/handle/10635/66899 000186902400048 Scopus |
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PHYSICS Seet, C.S. Zhang, B.C. Yong, C. Liew, S.L. Li, K. Hsia, L.C. Seng, H.L. Osiposwicz, T. Sudijono, J. Zeng, H.C. Tan, J.B. |
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Article |
author |
Seet, C.S. Zhang, B.C. Yong, C. Liew, S.L. Li, K. Hsia, L.C. Seng, H.L. Osiposwicz, T. Sudijono, J. Zeng, H.C. Tan, J.B. |
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Seet, C.S. Zhang, B.C. Yong, C. Liew, S.L. Li, K. Hsia, L.C. Seng, H.L. Osiposwicz, T. Sudijono, J. Zeng, H.C. Tan, J.B. Via resistance reduction using "cool" PVD-Ta processing |
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Seet, C.S. |
title |
Via resistance reduction using "cool" PVD-Ta processing |
title_short |
Via resistance reduction using "cool" PVD-Ta processing |
title_full |
Via resistance reduction using "cool" PVD-Ta processing |
title_fullStr |
Via resistance reduction using "cool" PVD-Ta processing |
title_full_unstemmed |
Via resistance reduction using "cool" PVD-Ta processing |
title_sort |
via resistance reduction using "cool" pvd-ta processing |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/66899 |
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