Via resistance reduction using "cool" PVD-Ta processing

Via resistance reduction using "cool" PVD-Ta processing

10.1149/1.1621417

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Bibliographic Details
Main Authors: Seet, C.S., Zhang, B.C., Yong, C., Liew, S.L., Li, K., Hsia, L.C., Seng, H.L., Osiposwicz, T., Sudijono, J., Zeng, H.C., Tan, J.B.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/66899
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Institution: National University of Singapore

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