A thermoelectricity-lamp based integrated bake/chill system for photoresist processing

10.1109/IECON.2005.1568896

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Bibliographic Details
Main Authors: Tay, A., Chua, H.-T., Ho, W.-S., Zhou, Y.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/69105
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Institution: National University of Singapore
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Summary:10.1109/IECON.2005.1568896