Impact of metal gate work function on nano CMOS device performance

Impact of metal gate work function on nano CMOS device performance

International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT

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Bibliographic Details
Main Authors: Hou, Y.T., Low, T., Xu, B., Li, M.-F., Samudra, G., Kwong, D.L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/70537
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/70537

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