Impact of metal gate work function on nano CMOS device performance

Impact of metal gate work function on nano CMOS device performance

International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT

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Bibliographic Details
Main Authors:	Hou, Y.T., Low, T., Xu, B., Li, M.-F., Samudra, G., Kwong, D.L.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/70537
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Institution:	National University of Singapore

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