Effectiveness of aluminum incorporation in nickel silicide and nickel germanide metal gates for work function reduction

Effectiveness of aluminum incorporation in nickel silicide and nickel germanide metal gates for work function reduction

10.1143/JJAP.47.2383

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Bibliographic Details
Main Authors: Lim, A.E.-J., Lee, R.T.P., Koh, A.T.Y., Samudra, G.S., Kwong, D.-L., Yeo, Y.-C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Al
Fully-germanided
Fully-silicided
Metal gate
NiGe
NiSi
Work function
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82218
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/82218

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