Effectiveness of aluminum incorporation in nickel silicide and nickel germanide metal gates for work function reduction
10.1143/JJAP.47.2383
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Main Authors: | Lim, A.E.-J., Lee, R.T.P., Koh, A.T.Y., Samudra, G.S., Kwong, D.-L., Yeo, Y.-C. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/82218 |
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Institution: | National University of Singapore |
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