Thermally stable fully silicided Hf-silicide metal-gate electrode

Thermally stable fully silicided Hf-silicide metal-gate electrode

10.1109/LED.2004.829043

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Bibliographic Details
Main Authors: Park, C.S., Cho, B.J., Kwong, D.-L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Others
Published: 2014
Subjects:
CMOS
Dual-metal-gate
Hf-silicide and work-function
Silicide
Online Access:http://scholarbank.nus.edu.sg/handle/10635/68066
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/68066

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