Thermally stable fully silicided Hf-silicide metal-gate electrode

10.1109/LED.2004.829043

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Bibliographic Details
Main Authors: Park, C.S., Cho, B.J., Kwong, D.-L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Others
Published: 2014
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Online Access:http://scholarbank.nus.edu.sg/handle/10635/68066
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spelling sg-nus-scholar.10635-680662023-10-30T21:57:38Z Thermally stable fully silicided Hf-silicide metal-gate electrode Park, C.S. Cho, B.J. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING CMOS Dual-metal-gate Hf-silicide and work-function Silicide 10.1109/LED.2004.829043 IEEE Electron Device Letters 25 6 372-374 EDLED 2014-06-18T05:34:02Z 2014-06-18T05:34:02Z 2004-06 Others Park, C.S., Cho, B.J., Kwong, D.-L. (2004-06). Thermally stable fully silicided Hf-silicide metal-gate electrode. IEEE Electron Device Letters 25 (6) : 372-374. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2004.829043 07413106 http://scholarbank.nus.edu.sg/handle/10635/68066 000221659700010 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic CMOS
Dual-metal-gate
Hf-silicide and work-function
Silicide
spellingShingle CMOS
Dual-metal-gate
Hf-silicide and work-function
Silicide
Park, C.S.
Cho, B.J.
Kwong, D.-L.
Thermally stable fully silicided Hf-silicide metal-gate electrode
description 10.1109/LED.2004.829043
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Park, C.S.
Cho, B.J.
Kwong, D.-L.
format Others
author Park, C.S.
Cho, B.J.
Kwong, D.-L.
author_sort Park, C.S.
title Thermally stable fully silicided Hf-silicide metal-gate electrode
title_short Thermally stable fully silicided Hf-silicide metal-gate electrode
title_full Thermally stable fully silicided Hf-silicide metal-gate electrode
title_fullStr Thermally stable fully silicided Hf-silicide metal-gate electrode
title_full_unstemmed Thermally stable fully silicided Hf-silicide metal-gate electrode
title_sort thermally stable fully silicided hf-silicide metal-gate electrode
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/68066
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