Thermally stable fully silicided Hf-silicide metal-gate electrode
10.1109/LED.2004.829043
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sg-nus-scholar.10635-680662023-10-30T21:57:38Z Thermally stable fully silicided Hf-silicide metal-gate electrode Park, C.S. Cho, B.J. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING CMOS Dual-metal-gate Hf-silicide and work-function Silicide 10.1109/LED.2004.829043 IEEE Electron Device Letters 25 6 372-374 EDLED 2014-06-18T05:34:02Z 2014-06-18T05:34:02Z 2004-06 Others Park, C.S., Cho, B.J., Kwong, D.-L. (2004-06). Thermally stable fully silicided Hf-silicide metal-gate electrode. IEEE Electron Device Letters 25 (6) : 372-374. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2004.829043 07413106 http://scholarbank.nus.edu.sg/handle/10635/68066 000221659700010 Scopus |
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CMOS Dual-metal-gate Hf-silicide and work-function Silicide |
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CMOS Dual-metal-gate Hf-silicide and work-function Silicide Park, C.S. Cho, B.J. Kwong, D.-L. Thermally stable fully silicided Hf-silicide metal-gate electrode |
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10.1109/LED.2004.829043 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Park, C.S. Cho, B.J. Kwong, D.-L. |
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Others |
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Park, C.S. Cho, B.J. Kwong, D.-L. |
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Park, C.S. |
title |
Thermally stable fully silicided Hf-silicide metal-gate electrode |
title_short |
Thermally stable fully silicided Hf-silicide metal-gate electrode |
title_full |
Thermally stable fully silicided Hf-silicide metal-gate electrode |
title_fullStr |
Thermally stable fully silicided Hf-silicide metal-gate electrode |
title_full_unstemmed |
Thermally stable fully silicided Hf-silicide metal-gate electrode |
title_sort |
thermally stable fully silicided hf-silicide metal-gate electrode |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/68066 |
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