In-situ critical dimension control during post-exposure bake with spectroscopic ellipsometry

In-situ critical dimension control during post-exposure bake with spectroscopic ellipsometry

10.1117/12.916133

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Bibliographic Details
Main Authors: Ngo, Y.S., Qu, Y., Tay, A., Lee, T.H.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Chemically amplified resist
Critical dimensions control
Post-exposure bake
Spectroscopic ellipsometer
Online Access:http://scholarbank.nus.edu.sg/handle/10635/70606
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Institution: National University of Singapore
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Summary:10.1117/12.916133

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