In-situ critical dimension control during post-exposure bake with spectroscopic ellipsometry

10.1117/12.916133

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Bibliographic Details
Main Authors:	Ngo, Y.S., Qu, Y., Tay, A., Lee, T.H.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Subjects:	Chemically amplified resist Critical dimensions control Post-exposure bake Spectroscopic ellipsometer
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/70606
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-70606
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spelling	sg-nus-scholar.10635-706062024-11-14T02:32:22Z In-situ critical dimension control during post-exposure bake with spectroscopic ellipsometry Ngo, Y.S. Qu, Y. Tay, A. Lee, T.H. ELECTRICAL & COMPUTER ENGINEERING Chemically amplified resist Critical dimensions control Post-exposure bake Spectroscopic ellipsometer 10.1117/12.916133 Proceedings of SPIE - The International Society for Optical Engineering 8324 - PSISD 2014-06-19T03:14:05Z 2014-06-19T03:14:05Z 2012 Conference Paper Ngo, Y.S., Qu, Y., Tay, A., Lee, T.H. (2012). In-situ critical dimension control during post-exposure bake with spectroscopic ellipsometry. Proceedings of SPIE - The International Society for Optical Engineering 8324 : -. ScholarBank@NUS Repository. https://doi.org/10.1117/12.916133 9780819489807 0277786X http://scholarbank.nus.edu.sg/handle/10635/70606 000304299900088 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Chemically amplified resist Critical dimensions control Post-exposure bake Spectroscopic ellipsometer
spellingShingle	Chemically amplified resist Critical dimensions control Post-exposure bake Spectroscopic ellipsometer Ngo, Y.S. Qu, Y. Tay, A. Lee, T.H. In-situ critical dimension control during post-exposure bake with spectroscopic ellipsometry
description	10.1117/12.916133
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Ngo, Y.S. Qu, Y. Tay, A. Lee, T.H.
format	Conference or Workshop Item
author	Ngo, Y.S. Qu, Y. Tay, A. Lee, T.H.
author_sort	Ngo, Y.S.
title	In-situ critical dimension control during post-exposure bake with spectroscopic ellipsometry
title_short	In-situ critical dimension control during post-exposure bake with spectroscopic ellipsometry
title_full	In-situ critical dimension control during post-exposure bake with spectroscopic ellipsometry
title_fullStr	In-situ critical dimension control during post-exposure bake with spectroscopic ellipsometry
title_full_unstemmed	In-situ critical dimension control during post-exposure bake with spectroscopic ellipsometry
title_sort	in-situ critical dimension control during post-exposure bake with spectroscopic ellipsometry
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/70606
_version_	1821189246257463296

In-situ critical dimension control during post-exposure bake with spectroscopic ellipsometry

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