In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence

10.1117/12.847879

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Bibliographic Details
Main Authors:	Wu, X., Yang, G., Lim, E.-X., Tay, A.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Subjects:	Photoresist processing Real-time control Temperature control
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/70610
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-70610
record_format	dspace
spelling	sg-nus-scholar.10635-706102015-01-16T14:08:01Z In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence Wu, X. Yang, G. Lim, E.-X. Tay, A. ELECTRICAL & COMPUTER ENGINEERING Photoresist processing Real-time control Temperature control 10.1117/12.847879 Proceedings of SPIE - The International Society for Optical Engineering 7520 - PSISD 2014-06-19T03:14:08Z 2014-06-19T03:14:08Z 2009 Conference Paper Wu, X.,Yang, G.,Lim, E.-X.,Tay, A. (2009). In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence. Proceedings of SPIE - The International Society for Optical Engineering 7520 : -. ScholarBank@NUS Repository. <a href="https://doi.org/10.1117/12.847879" target="_blank">https://doi.org/10.1117/12.847879</a> 9780819479099 0277786X http://scholarbank.nus.edu.sg/handle/10635/70610 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
topic	Photoresist processing Real-time control Temperature control
spellingShingle	Photoresist processing Real-time control Temperature control Wu, X. Yang, G. Lim, E.-X. Tay, A. In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence
description	10.1117/12.847879
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Wu, X. Yang, G. Lim, E.-X. Tay, A.
format	Conference or Workshop Item
author	Wu, X. Yang, G. Lim, E.-X. Tay, A.
author_sort	Wu, X.
title	In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence
title_short	In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence
title_full	In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence
title_fullStr	In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence
title_full_unstemmed	In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence
title_sort	in-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/70610
_version_	1681087231610060800

In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence

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