In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence
10.1117/12.847879
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sg-nus-scholar.10635-706102015-01-16T14:08:01Z In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence Wu, X. Yang, G. Lim, E.-X. Tay, A. ELECTRICAL & COMPUTER ENGINEERING Photoresist processing Real-time control Temperature control 10.1117/12.847879 Proceedings of SPIE - The International Society for Optical Engineering 7520 - PSISD 2014-06-19T03:14:08Z 2014-06-19T03:14:08Z 2009 Conference Paper Wu, X.,Yang, G.,Lim, E.-X.,Tay, A. (2009). In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence. Proceedings of SPIE - The International Society for Optical Engineering 7520 : -. ScholarBank@NUS Repository. <a href="https://doi.org/10.1117/12.847879" target="_blank">https://doi.org/10.1117/12.847879</a> 9780819479099 0277786X http://scholarbank.nus.edu.sg/handle/10635/70610 NOT_IN_WOS Scopus |
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Photoresist processing Real-time control Temperature control |
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Photoresist processing Real-time control Temperature control Wu, X. Yang, G. Lim, E.-X. Tay, A. In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence |
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10.1117/12.847879 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Wu, X. Yang, G. Lim, E.-X. Tay, A. |
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Conference or Workshop Item |
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Wu, X. Yang, G. Lim, E.-X. Tay, A. |
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Wu, X. |
title |
In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence |
title_short |
In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence |
title_full |
In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence |
title_fullStr |
In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence |
title_full_unstemmed |
In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence |
title_sort |
in-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/70610 |
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1681087231610060800 |