In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence
10.1117/12.847879
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Main Authors: | Wu, X., Yang, G., Lim, E.-X., Tay, A. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/70610 |
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Institution: | National University of Singapore |
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