In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence

In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence

10.1117/12.847879

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Bibliographic Details
Main Authors: Wu, X., Yang, G., Lim, E.-X., Tay, A.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Photoresist processing
Real-time control
Temperature control
Online Access:http://scholarbank.nus.edu.sg/handle/10635/70610
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Institution: National University of Singapore

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