M-V MOSFETs: Surface passivation, source/drain and channel strain engineering, self-aligned contact metallization
ECS Transactions
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sg-nus-scholar.10635-710832015-01-26T13:53:18Z M-V MOSFETs: Surface passivation, source/drain and channel strain engineering, self-aligned contact metallization Yeo, Y.-C. Chin, H.-C. Gong, X. Guo, H. Zhang, X. ELECTRICAL & COMPUTER ENGINEERING ECS Transactions 35 3 351-361 2014-06-19T03:19:39Z 2014-06-19T03:19:39Z 2011 Conference Paper Yeo, Y.-C.,Chin, H.-C.,Gong, X.,Guo, H.,Zhang, X. (2011). M-V MOSFETs: Surface passivation, source/drain and channel strain engineering, self-aligned contact metallization. ECS Transactions 35 (3) : 351-361. ScholarBank@NUS Repository. 9781566778640 19385862 http://scholarbank.nus.edu.sg/handle/10635/71083 NOT_IN_WOS Scopus |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Yeo, Y.-C. Chin, H.-C. Gong, X. Guo, H. Zhang, X. |
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Conference or Workshop Item |
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Yeo, Y.-C. Chin, H.-C. Gong, X. Guo, H. Zhang, X. |
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Yeo, Y.-C. Chin, H.-C. Gong, X. Guo, H. Zhang, X. M-V MOSFETs: Surface passivation, source/drain and channel strain engineering, self-aligned contact metallization |
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Yeo, Y.-C. |
title |
M-V MOSFETs: Surface passivation, source/drain and channel strain engineering, self-aligned contact metallization |
title_short |
M-V MOSFETs: Surface passivation, source/drain and channel strain engineering, self-aligned contact metallization |
title_full |
M-V MOSFETs: Surface passivation, source/drain and channel strain engineering, self-aligned contact metallization |
title_fullStr |
M-V MOSFETs: Surface passivation, source/drain and channel strain engineering, self-aligned contact metallization |
title_full_unstemmed |
M-V MOSFETs: Surface passivation, source/drain and channel strain engineering, self-aligned contact metallization |
title_sort |
m-v mosfets: surface passivation, source/drain and channel strain engineering, self-aligned contact metallization |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/71083 |
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