M-V MOSFETs: Surface passivation, source/drain and channel strain engineering, self-aligned contact metallization

ECS Transactions

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Main Authors: Yeo, Y.-C., Chin, H.-C., Gong, X., Guo, H., Zhang, X.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/71083
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-710832015-01-26T13:53:18Z M-V MOSFETs: Surface passivation, source/drain and channel strain engineering, self-aligned contact metallization Yeo, Y.-C. Chin, H.-C. Gong, X. Guo, H. Zhang, X. ELECTRICAL & COMPUTER ENGINEERING ECS Transactions 35 3 351-361 2014-06-19T03:19:39Z 2014-06-19T03:19:39Z 2011 Conference Paper Yeo, Y.-C.,Chin, H.-C.,Gong, X.,Guo, H.,Zhang, X. (2011). M-V MOSFETs: Surface passivation, source/drain and channel strain engineering, self-aligned contact metallization. ECS Transactions 35 (3) : 351-361. ScholarBank@NUS Repository. 9781566778640 19385862 http://scholarbank.nus.edu.sg/handle/10635/71083 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description ECS Transactions
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Yeo, Y.-C.
Chin, H.-C.
Gong, X.
Guo, H.
Zhang, X.
format Conference or Workshop Item
author Yeo, Y.-C.
Chin, H.-C.
Gong, X.
Guo, H.
Zhang, X.
spellingShingle Yeo, Y.-C.
Chin, H.-C.
Gong, X.
Guo, H.
Zhang, X.
M-V MOSFETs: Surface passivation, source/drain and channel strain engineering, self-aligned contact metallization
author_sort Yeo, Y.-C.
title M-V MOSFETs: Surface passivation, source/drain and channel strain engineering, self-aligned contact metallization
title_short M-V MOSFETs: Surface passivation, source/drain and channel strain engineering, self-aligned contact metallization
title_full M-V MOSFETs: Surface passivation, source/drain and channel strain engineering, self-aligned contact metallization
title_fullStr M-V MOSFETs: Surface passivation, source/drain and channel strain engineering, self-aligned contact metallization
title_full_unstemmed M-V MOSFETs: Surface passivation, source/drain and channel strain engineering, self-aligned contact metallization
title_sort m-v mosfets: surface passivation, source/drain and channel strain engineering, self-aligned contact metallization
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/71083
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