A new self-aligned contact technology for III-V MOSFETs

• Main Authors: Guo, H., Zhang, X., Chin, H.-C., Gong, X., Koh, S.-M., Zhan, C., Luo, G.-L., Chang, C.-Y., Lin, H.-Y., Chien, C.-H., Han, Z.-Y., Huang, S.-C., Cheng, C.-C., Ko, C.-H., Wann, C.H., Yeo, Y.-C.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/83388
• Institution: National University of Singapore

10.1109/VTSA.2010.5488907